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dc.contributor.author Ruiz-Fernández, Alvaro R.
dc.contributor.author Campos, Leonardo
dc.contributor.author Gutierrez-Maldonado, Sebastian E.
dc.contributor.author Núñez, Gonzalo
dc.contributor.author Villanelo, Felipe
dc.contributor.author Perez-Acle, Tomas
dc.date.accessioned 2024-09-26T00:27:04Z
dc.date.available 2024-09-26T00:27:04Z
dc.date.issued 2022-06-01
dc.identifier.issn 1661-6596
dc.identifier.uri https://repositorio.uss.cl/handle/uss/12192
dc.description Publisher Copyright: © 2022 by the authors. Licensee MDPI, Basel, Switzerland.
dc.description.abstract Nanosecond Pulsed Electric Field (nsPEF) is an electrostimulation technique first developed in 1995; nsPEF requires the delivery of a series of pulses of high electric fields in the order of nanoseconds into biological tissues or cells. They primary effects in cells is the formation of membrane nanopores and the activation of ionic channels, leading to an incremental increase in cytoplasmic Ca2+ concentration, which triggers a signaling cascade producing a variety of effects: from apoptosis up to cell differentiation and proliferation. Further, nsPEF may affect organelles, making nsPEF a unique tool to manipulate and study cells. This technique is exploited in a broad spectrum of applications, such as: sterilization in the food industry, seed germination, anti-parasitic effects, wound healing, increased immune response, activation of neurons and myocites, cell proliferation, cellular phenotype manipulation, modulation of gene expression, and as a novel cancer treatment. This review thoroughly explores both nsPEF’s history and applications, with emphasis on the cellular effects from a biophysics perspective, highlighting the role of ionic channels as a mechanistic driver of the increase in cytoplasmic Ca2+ concentration. en
dc.language.iso eng
dc.relation.ispartof vol. 23 Issue: no. 11 Pages:
dc.source International Journal of Molecular Sciences
dc.title Nanosecond Pulsed Electric Field (nsPEF) : Opening the Biotechnological Pandora’s Box en
dc.type Artículo
dc.identifier.doi 10.3390/ijms23116158
dc.publisher.department Facultad de Ingeniería y Tecnología
dc.publisher.department Facultad de Ingeniería, Arquitectura y Diseño


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